SPUTTERING TARGET FOR SOLAR CELL

摘要

This sputtering target for solar cells is characterized in being formed by bonding together a backing plate and a target material using an indium-tin alloy bonding material or an indium-gallium alloy bonding material, said target material being obtained by making the thickness of an indium ingot 70 % of the original thickness thereof or less by processing the ingot by applying physical stress thereto. This sputtering target for solar cells has a high sputter rate at the sputter initial stage, a small sputter rate reduction with time, and can form an indium film having more uniform qualities. Namely, the high-rate formation of the film having the uniform qualities can be expected until the end of the service-life.