发明名称 URETHANE FORM POLISHING PAD AND METHOD OF MANUFACTURING THE SAME
摘要 PURPOSE: A urethane foam grinding pad and a manufacturing method thereof are provided to extend the usable life without staining joints and to well disperse inorganic particles into a grinding pad. CONSTITUTION: A urethane foam grinding pad is composed of 1-400 wt.% of an inorganic particle with respect to 100 wt% of a foaming composition containing the polyol of polyester or polyester series. The foaming composition contains 0.1-8 of an isocyanate, 0.01-20 wt.% of a cross linking agent, 0.01-10 wt.% of a catalyst, 0.01-10 wt.% of a surfactant, and 0.01-50 wt.% of a foaming agent with respect to 100 wt.% of the polyol. The inorganic particle is composed of mixture mixing at least one or two of Al2O3, SiO2, ZrO2, ZnO, SiC, CeO2, SiC, WC, Si3N4, and glass powders. [Reference numerals] (AA) Optical image; (BB) SEM image
申请公布号 KR20120114788(A) 申请公布日期 2012.10.17
申请号 KR20110032543 申请日期 2011.04.08
申请人 ROH, TAE WOOK 发明人 ROH, TAE WOOK;MUN, JI HUN
分类号 B24D11/00;B24B37/04;B24D3/20;B24D18/00 主分类号 B24D11/00
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