| 发明名称 |
Topcoat compositions for photoresist and immersion photolithography process using them |
| 摘要 |
<p>Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.</p> |
| 申请公布号 |
EP2511766(A1) |
申请公布日期 |
2012.10.17 |
| 申请号 |
EP20120163989 |
申请日期 |
2012.04.12 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
WANG, DEYAN |
| 分类号 |
G03F7/20;G03F7/004;G03F7/038;G03F7/039;G03F7/11 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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