发明名称 |
Apparatus and method for three dimensional ion processing |
摘要 |
A method for treating a workpiece. The method includes directing a first ion beam to a first region of a workpiece, wherein the first ion beam has a first ion angular profile of first ions extracted through an aperture of an extraction plate. The method also includes directing a second ion beam to the first region of the workpiece, wherein the second ion beam has a second ion angular profile different than the first ion profile of second ions extracted through the aperture of the extraction plate. |
申请公布号 |
US8288741(B1) |
申请公布日期 |
2012.10.16 |
申请号 |
US201113210959 |
申请日期 |
2011.08.16 |
申请人 |
MILLER TIMOTHY J.;GODET LUDOVIC;VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. |
发明人 |
MILLER TIMOTHY J.;GODET LUDOVIC |
分类号 |
G21K5/10;H01J37/08 |
主分类号 |
G21K5/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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