发明名称 Apparatus and method for three dimensional ion processing
摘要 A method for treating a workpiece. The method includes directing a first ion beam to a first region of a workpiece, wherein the first ion beam has a first ion angular profile of first ions extracted through an aperture of an extraction plate. The method also includes directing a second ion beam to the first region of the workpiece, wherein the second ion beam has a second ion angular profile different than the first ion profile of second ions extracted through the aperture of the extraction plate.
申请公布号 US8288741(B1) 申请公布日期 2012.10.16
申请号 US201113210959 申请日期 2011.08.16
申请人 MILLER TIMOTHY J.;GODET LUDOVIC;VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. 发明人 MILLER TIMOTHY J.;GODET LUDOVIC
分类号 G21K5/10;H01J37/08 主分类号 G21K5/10
代理机构 代理人
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