发明名称 |
Methods and compositions for forming aperiodic patterned copolymer films |
摘要 |
The present invention provides improved and compositions methods for replicating substrate patterns including patterns containing irregular features. The methods of the invention involve depositing block copolymer materials on a patterned substrate and ordering components in the material to replicate the pattern. In some embodiments, ordering is facilitated through the use of blends of the copolymer material and/or configuring substrate patterns so that regions of the substrate pattern interact in a highly preferential manner with at least one of the components in the copolymer material. The invention also provides compositions containing a substrate pattern with irregular features replicated in a block copolymer material. |
申请公布号 |
US8287957(B2) |
申请公布日期 |
2012.10.16 |
申请号 |
US20050286260 |
申请日期 |
2005.11.22 |
申请人 |
NEALEY PAUL F.;KIM SANGOUK;EDWARDS ERIK W.;STOYKOVICH MARK P.;DE PABLO JUAN J.;WISCONSIN ALUMNI RESEARCH FOUNDATION |
发明人 |
NEALEY PAUL F.;KIM SANGOUK;EDWARDS ERIK W.;STOYKOVICH MARK P.;DE PABLO JUAN J. |
分类号 |
B05D5/00 |
主分类号 |
B05D5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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