发明名称 |
Clad textured metal substrate for forming epitaxial thin film thereon and method for manufacturing the same |
摘要 |
The present invention provides an oriented substrate for forming an epitaxial thin film thereon, which has a more excellent orientation than that of a conventional one and a high strength, and a method for manufacturing the same. The present invention provides a clad textured metal substrate for forming the epitaxial thin film thereon, which includes a metallic layer and a silver layer bonded to at least one face of the metallic layer, wherein the silver layer has a {100}<001> cube texture in which a deviating angle &Dgr;&phgr; of crystal axes satisfies &Dgr;&phgr;≦̸9 degree. The textured metal substrate can be manufactured by subjecting the silver sheet containing 30 to 200 ppm oxygen by concentration to the orienting treatment of hot-working and heat-treating, and bonding the metal sheet with the oriented silver sheet by using a surface activated bonding process. |
申请公布号 |
US8287643(B2) |
申请公布日期 |
2012.10.16 |
申请号 |
US20080101385 |
申请日期 |
2008.04.11 |
申请人 |
KASHIMA NAOJI;NAGAYA SHIGEO;SHIMA KUNIHIRO;HOSHINO HIROFUMI;CHUBU ELECTRIC POWER CO., INC.;TANAKA KIKINZOKU KOGYO K.K. |
发明人 |
KASHIMA NAOJI;NAGAYA SHIGEO;SHIMA KUNIHIRO;HOSHINO HIROFUMI |
分类号 |
C30B33/06;C30B1/00;C30B3/00;C30B5/00;C30B28/02 |
主分类号 |
C30B33/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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