发明名称 Vacuum processing apparatus
摘要 The invention provides a highly reliable plasma processing apparatus having stable sealing performance. The vacuum processing apparatus comprises a vacuum vessel having its inside decompressed; an opening disposed in a wall of the vacuum vessel for communicating the inside with the outside thereof and through which a sample to be processed is taken in and out; a valve body 701 disposed outside the wall for airtightly sealing or opening the opening; and a drive unit for driving the valve body to carry out the sealing or opening operation, the drive unit comprising a first member 705 coupled to an actuator 702 that moves along a substantially linear first direction as a result of operation of the actuator, a second member 706 coupled to the first member 705 that moves along a substantially linear second direction that intersects with the first direction, and the valve body 701 coupled to the second member that seals the opening as a result of the movement of the second member.
申请公布号 US8286822(B2) 申请公布日期 2012.10.16
申请号 US20100651701 申请日期 2010.01.04
申请人 TAUCHI SUSUMU;MAKINO AKITAKA;HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 TAUCHI SUSUMU;MAKINO AKITAKA
分类号 B65D6/40;B65D43/04;B65D53/02 主分类号 B65D6/40
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