发明名称 |
Method for manufacture of semiconductor bearing thin film material |
摘要 |
A method for forming a semiconductor bearing thin film material. The method includes providing a metal precursor and a chalcogene precursor. The method forms a mixture of material comprising the metal precursor, the chalcogene precursor and a solvent material. The mixture of material is deposited overlying a surface region of a substrate member. In a specific embodiment, the method maintains the substrate member including the mixture of material in an inert environment and subjects the mixture of material to a first thermal process to cause a reaction between the metal precursor and the chalcogene material to form a semiconductor metal chalcogenide bearing material overlying the substrate member. The method then performs a second thermal process to remove any residual solvent and forms a substantially pure semiconductor metal chalcogenide thin film material overlying the substrate member.
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申请公布号 |
US8287942(B1) |
申请公布日期 |
2012.10.16 |
申请号 |
US20080237377 |
申请日期 |
2008.09.24 |
申请人 |
HUANG JINMAN;LEE HOWARD W. H.;STION CORPORATION |
发明人 |
HUANG JINMAN;LEE HOWARD W. H. |
分类号 |
B05D5/12 |
主分类号 |
B05D5/12 |
代理机构 |
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