发明名称 |
System and method for treating substrate |
摘要 |
A method and system for treating a substrate are provided. The system includes a coating unit, a pre/post-exposure treatment unit, and a developing unit. Each of the units includes a load port and an index module. The pre/post-exposure treatment unit includes first and second modules that are arranged in different layers. The first module performs a process for coating a protective layer on the wafer before an exposure process. The second module performs a process for cleaning the wafer and a post-exposure bake process after the exposure process. |
申请公布号 |
US8289496(B2) |
申请公布日期 |
2012.10.16 |
申请号 |
US20100656425 |
申请日期 |
2010.01.29 |
申请人 |
KIM DONG HO;CHOI JINYOUNG;GO JAESEUNG;HWANG SOOMIN;SEMES CO., LTD. |
发明人 |
KIM DONG HO;CHOI JINYOUNG;GO JAESEUNG;HWANG SOOMIN |
分类号 |
G03B27/32;B05C13/02;G03D5/00 |
主分类号 |
G03B27/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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