CYLINDRICAL SPUTTERING CATHODE DEVICE

摘要

PURPOSE: A cylindrical sputtering cathode apparatus is provided to prevent increase in manufacturing costs for a sputtering system by minimizing target particles transferred to a specimen during a pre-sputtering process in a simple structure. CONSTITUTION: A cylindrical sputtering cathode apparatus comprises a cylindrical target(21) which is supported on a support and allowed to rotate forwardly and reversely, a magnet(31) which is installed in the target and allowed to move toward or opposite to a specimen, a driving unit which rotates the target forwardly and reversely and rotates or holds the magnet, and a magnet supporting shaft(33) which is inserted to shaft insertion holes at both ends and provided with torque from the driving unit.