| 摘要 |
<p>A lithographic apparatus includes an optical column configured to create a pattern on a target portion of a substrate, the optical column including a controllable element (906) configured to provide a beam; and a projection system configured to project the beam onto the target portion; an actuator (936) configured to move at least a part (924, 940) of the optical column with respect to the substrate; a measurement system (938, 940) configured to measure a position of the at least part of the optical column; and a controller (942) configured to drive the controllable element, the controller being provided with an output signal of the measurement system.</p> |
