发明名称 METHOD FOR GRINDING WAFER
摘要 PURPOSE: A method for grinding a wafer is provided to prevent the loading of a grinding wheel by filling a gap between a substrate and a chamfer with resins. CONSTITUTION: A light emitting layer(11) is laminated on the surface of a sapphire substrate(10). A chamfer(12) is formed in the outside of a surface(1a) of a wafer(1). An acryl based adhesive is coated on a surface(2a) of a hard substrate(2). The hard substrate is larger than the wafer. Resins(3) are filled in a gap between the chamfer and the hard substrate.
申请公布号 KR20120113662(A) 申请公布日期 2012.10.15
申请号 KR20120033016 申请日期 2012.03.30
申请人 DISCO CORPORATION 发明人 YAMAGUCHI TAKASHI;SUZUKI MASAAKI;KUNISHIGE HITOSHI;KOYAMA MASASHI;SUGIOKA YUSUKE;TANAKA KAZUMA
分类号 H01L21/304 主分类号 H01L21/304
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