CLEANING RETICLE, METHOD FOR CLEANING RETICLE STAGE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A cleaning reticle, a method for cleaning a reticle stage, and a method for manufacturing a semiconductor device are provided to increase an amount of exposure operations by cleaning a reticle stage in a vacuum stage. CONSTITUTION: A substrate(11) transmits ultraviolet rays. An adhesive material layer(12) is formed on the rear(11a) of the substrate and is hardened by irradiating ultraviolet rays. An alignment mark(13) is formed on the surface(11b) of the substrate. The location of the cleaning reticle is determined by using the alignment mark.