发明名称 EXPOSURE DEVICE USING MICROLENS ARRAY
摘要 <p>A mask is provided with a plurality of pattern regions in which is formed a pattern having a width (Wp) identical to that of a panel to be formed. The pattern regions are arranged at a pitch (nP) which is n-times larger than the arrangement pitch (P) in a second direction of the panel to be manufactured (where n is an integer greater than or equal to 2). A microlens array for forming an erect equal-magnification image of the pattern on a substrate is obtained by arranging in the second direction the same number of microlens array chips as that of the pattern regions. Each of the microlens array chips has a length in the second direction that is greater than the width (Wp) of the pattern in the second direction. Light transmitted through each of the pattern regions is emitted onto the substrate by the corresponding microlens array chip. It is thereby possible to use the microlens array in an effective manner in accordance with the size of a liquid crystal display panel for portable equipment, and reduce waste of substrate material.</p>
申请公布号 WO2012137785(A1) 申请公布日期 2012.10.11
申请号 WO2012JP59102 申请日期 2012.04.03
申请人 V TECHNOLOGY CO., LTD.;MIZUMURA MICHINOBU 发明人 MIZUMURA MICHINOBU
分类号 G03F7/20;G02F1/13;H01L21/027 主分类号 G03F7/20
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