| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid processing apparatus and a liquid processing method capable of preventing or reducing the attachment of a processing liquid including a chemical liquid or a rinse liquid on a surface of a processing liquid supply nozzle that supplies the processing liquid. <P>SOLUTION: A liquid processing apparatus includes: substrate holding parts 30 and 40; a first processing liquid supply part including a first processing liquid discharge port array formed by arranging a plurality of first processing liquid discharge ports for discharging a first processing liquid on a substrate W held by the substrate holding parts 30 and 40; a second processing liquid supply part including a second processing liquid discharge port array formed by arranging a plurality of second processing liquid discharge ports for discharging a second processing liquid in approximately parallel to the first processing liquid discharge port array; and a first gas supply part including a first gas discharge port array formed by arranging a plurality of first gas discharge ports for discharging gas between the first processing liquid discharge port array and the second processing liquid discharge port array. The first gas discharge ports are arranged so as to discharge gas toward the second processing liquid supply part. <P>COPYRIGHT: (C)2013,JPO&INPIT |
