| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an abnormality prediction control device and method for a semiconductor manufacturing facility capable of following the life and predicting the damage of the semiconductor manufacturing facility, reducing a down time of the facility and a time required for restoration, and preventing a large amount of abnormalities in products. <P>SOLUTION: An abnormality prediction control device 200 for a semiconductor manufacturing facility 100 has a multichannel transmitter 210 connected between a first vibration detector 220 and a vibration spectrum analysis device 240. The multichannel transmitter 210 includes a multichannel connection module 212 having a plurality of signal connection terminals 213. The signal connection terminal 213 is connected with the first vibration detector 220, and with a first control signal connection wire 230 through which to connect with a first controller 120 corresponding to a first rotation type frequency conversion device 110. Thereby, life following and early damage prediction of the semiconductor manufacturing facility can be performed, and a down time of the facility and a time required for restoration can be reduced. <P>COPYRIGHT: (C)2013,JPO&INPIT |
