发明名称 DIAMOND-COATED END MILL EXCELLING IN PEELING RESISTANCE AND WEAR RESISTANCE
摘要 <P>PROBLEM TO BE SOLVED: To provide a diamond-coated end mill exhibiting excellent peeling resistance and wear resistance while relaxing residual stress in a film, and suitable for cutting a hard-to-cut material such as CFRP (carbon fiber reinforced plastics). <P>SOLUTION: Crystal phase 1 regions with the half-power band width of peaks being 15 cm<SP POS="POST">-1</SP>or less, and stress relaxed phase 2 regions with the half-power band width of peaks being 60-90 cm<SP POS="POST">-1</SP>when measuring the half-power band width of peaks near 1,333 cm<SP POS="POST">-1</SP>by making a Raman spectroscopic analysis of a diamond film surface along the axial direction of the end mill, are alternately formed in the axial direction of the film surface at least. Transition phase 6 regions with the half-power band width of peaks exceeding 15 cm<SP POS="POST">-1</SP>and being less than 60 cm<SP POS="POST">-1</SP>are formed in the length of 0.1-1.0 mm between the respective crystal phase 1 regions and stress relaxed phase 2 regions. Preferably, in a film cross section perpendicular to the axial direction, cross-sectional regions comprising crystal phases 1 with the half-power band width of peaks being 15 cm<SP POS="POST">-1</SP>or less and cross-sectional regions comprising stress relaxed phases 2 with the half-power band width of peaks being 60-90 cm<SP POS="POST">-1</SP>are alternately formed in the average film thickness of 0.1-2.0 &mu;m in the film thickness direction of the film. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012192462(A) 申请公布日期 2012.10.11
申请号 JP20110056075 申请日期 2011.03.15
申请人 MITSUBISHI MATERIALS CORP 发明人 TAKASHIMA HIDEAKI;OSHIMA HIDEO;TAKAOKA HIDEMITSU
分类号 B23C5/16;C23C16/27 主分类号 B23C5/16
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