| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a coating film on a processed substrate without causing coating spots, reduce the cost, and improve the production efficiency. <P>SOLUTION: A coating film formation apparatus includes: nozzle moving means 20 moving a nozzle 16 relative to a substrate G on a substrate conveyance path; and control means 50 performing drive control of the nozzle and the nozzle moving means. The control means places the nozzle at a coating start region of the substrate through the nozzle moving means and discharges a processing liquid R from a discharge port of the nozzle to apply the processing liquid R to the substrate in the coating start region. Further, the control means moves the nozzle for a predetermined distance in the scanning direction through the nozzle moving means in the coating start region. <P>COPYRIGHT: (C)2013,JPO&INPIT |
