发明名称 MEASURING APPARATUS AND PLASMA PROCESSING APPARATUS
摘要 <p>PURPOSE: A measuring apparatus and a plasma processing apparatus are provided to broaden a range of a measurable subject by increasing wavelength resolution. CONSTITUTION: A first mirror(102) and a second mirror(106) are installed to reflect incident light to a desired direction. The light reflected from the second mirror enters a photodiode array(108). The incident light from an entrance slit(101) is reflected to the first mirror and is irradiated to a diffraction grid(104). The photodiode array detects power of the light. A controller(120) comprises a driving part(124), a measuring part(126), and a memory part(128). [Reference numerals] (100) Spectroscope; (120) Controller; (121) Synchronization part; (122) Driver; (124) Drive part; (126) Measuring part; (128) Memory part; (AA) Light entering</p>
申请公布号 KR20120112238(A) 申请公布日期 2012.10.11
申请号 KR20120033278 申请日期 2012.03.30
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUDO TATSUO;KIMURA HIDETOSHI
分类号 H01L21/66 主分类号 H01L21/66
代理机构 代理人
主权项
地址