Wafer charge compensation device and ion implantation system having the same,申请号KR20050062577-传众专利搜索

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发明名称	Wafer charge compensation device and ion implantation system having the same
摘要
申请公布号	KR101190115(B1)	申请公布日期	2012.10.11
申请号	KR20050062577	申请日期	2005.07.12
申请人		发明人
分类号	H01L21/265	主分类号	H01L21/265
代理机构		代理人
主权项
地址

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