发明名称 SUBSTRATE TRANSPORT METHOD, SUBSTRATE TRANSPORT APPARATUS, AND COATING AND DEVELOPING SYSTEM
摘要 A substrate transporting method includes: after a holding unit of a substrate holding apparatus receives a substrate from one placement location for a substrate and holds it, detecting a first positional deviation of the substrate from a reference position of the substrate on the holding unit; transporting the substrate held by the holding unit to a position facing another placement location; detecting a second positional deviation of the substrate from the reference position of the substrate on the holding unit, when the substrate is located at the position facing the another placement location; calculating, based on the first and second positional deviations, a positional displacement of the substrate relative to the holding unit that occurred during the transporting of the substrate to the position facing the another placement location; and determining whether or not the positional displacement thus calculated falls within a predetermined range.
申请公布号 US2012257176(A1) 申请公布日期 2012.10.11
申请号 US201213442123 申请日期 2012.04.09
申请人 HAYASHI TOKUTAROU;TOKYO ELECTRON LIMITED 发明人 HAYASHI TOKUTAROU
分类号 G03B27/53;H01L21/677 主分类号 G03B27/53
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