发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND PRODUCING METHOD OF COMPOUND |
摘要 |
A radiation-sensitive resin composition includes a compound shown by a following general formula (A), a solvent and a resin having an acid-labile group. Each of R1 and R2 independently represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 25 carbon atoms. Each of X and Z independently represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 25 carbon atoms. Y represents a single bond or the like. n represents an integer from 0 to 5. |
申请公布号 |
US2012258399(A1) |
申请公布日期 |
2012.10.11 |
申请号 |
US201213525563 |
申请日期 |
2012.06.18 |
申请人 |
MARUYAMA KEN;JSR CORPORATION |
发明人 |
MARUYAMA KEN |
分类号 |
C07C309/75;C07C303/28;G03F7/004 |
主分类号 |
C07C309/75 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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