发明名称 RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND PRODUCING METHOD OF COMPOUND
摘要 A radiation-sensitive resin composition includes a compound shown by a following general formula (A), a solvent and a resin having an acid-labile group. Each of R1 and R2 independently represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 25 carbon atoms. Each of X and Z independently represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 25 carbon atoms. Y represents a single bond or the like. n represents an integer from 0 to 5.
申请公布号 US2012258399(A1) 申请公布日期 2012.10.11
申请号 US201213525563 申请日期 2012.06.18
申请人 MARUYAMA KEN;JSR CORPORATION 发明人 MARUYAMA KEN
分类号 C07C309/75;C07C303/28;G03F7/004 主分类号 C07C309/75
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