| 摘要 |
Disclosed is an exposure device provided with: a beam spot generation means (9) that receives light (L1) from a light source and generates a plurality of beam spots at prescribed intervals, in at least two staggered rows; an optical scanning means (10) that moves the plurality of beam spots back and forth a prescribed amount in the direction in which the rows of beam spots extend; a pattern generator (11); and a projection lens (12). A plurality of prism-shaped switching elements comprising an electro-optical crystal material are arranged such that the central axes thereof are aligned with the centers of the back-and-forth scan ranges of the aforementioned beam spots, and each switching element is provided with a pair of electrodes on an opposing surface parallel to the central axis of said switching element. The switching elements are wider in the scan direction of the beam spots than the beam spots are. By turning the plurality of switching elements on and off, the pattern generator (11) optically modulates the aforementioned light (L1) to generate a prescribed pattern of light and dark. The projection lens (12) projects said pattern onto a color filter substrate (5).
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