| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which can perform uniform processing using a showerhead having a shower plate whose gas discharge part employs double layer structure of metal and ceramics. <P>SOLUTION: A showerhead 18 comprises: a metallic upper plate 61 on which a gas inlet hole 61a is formed; a metallic lower plate 62 on which a plurality of gas passage holes 66 are formed; gas diffusing space S provided between the upper plate 61 and the lower plate 62; a ceramics-made cover member 64 that is provided so as to cover a whole area of the underside on the lower plate 62 and where a plurality of gas discharging holes 67 are formed corresponding to the gas passage holes 66; and a plurality of heat transfer members 70a, 70b that so as to connect a gap between the upper plate 61 and the lower plate 62 in the gas diffusing space S to transfer heat generated accompanied by processing to an upper side. <P>COPYRIGHT: (C)2013,JPO&INPIT |
