| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which has good resolution and adhesion, ensures a very small trail of a cured resist after development, and also has good detachability; and a photoresist film including a photosensitive resin composition layer composed of the photosensitive resin composition and a support layer. <P>SOLUTION: Provided is a photosensitive resin composition containing (A) binder polymer, (B) photopolymerizable monomer having an amino group, (C) photopolymerization initiator, and (D) benzotriazole derivative having a carboxyl group. Also provided is a photoresist film including a photosensitive resin composition layer composed of the photosensitive resin composition and a support layer. <P>COPYRIGHT: (C)2013,JPO&INPIT |
