| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a deposition device which does not enlarge a deposition mask equally with the enlargement of a base board, can deposit deposition membranes of film-forming patterns by using the deposition mask in a wide range by relatively moving even the deposition mask which is smaller in size than the base board in a state that the base board is separated, can prevent the overlap of the film-forming patterns, can suppress the incidence of radiation heat from an evaporation source, and can perform deposition at high accuracy and at a high rate; and to provide a deposition method. <P>SOLUTION: The deposition device is characterized in that: a mask holder 6 having a scatter limit part at a limiting opening 5 is arranged between the evaporation source 1 and the base board 4; the evaporation mask 2 is joined and additionally attached to the mask holder 6; the base board 4 is relatively and movably constituted while holding a separation state with the deposition mask 2 with respect to the mask holder 6 attached with the evaporation mask 2 and the evaporation source 1; and an evaporation opening 8 of the evaporation source 1 is formed into a slit shape which is long in the relative movement direction of the base board 4 and narrowed in width toward the lateral direction orthogonal to the relative movement direction. <P>COPYRIGHT: (C)2013,JPO&INPIT |
