METHOD OF CLEANING PIPE OF IMMERSION EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE

摘要

A method of cleaning a supply pipe of an immersion exposure apparatus includes a cycle including a step of increasing a flow rate of a cleaning liquid via a supply pipe, which supplies a liquid to a gap between a substrate and a final surface of a projection optical system, and a step of decreasing the flow rate, wherein the cycle is executed a plurality of times after one of completion of one of setting and maintenance of the immersion exposure apparatus and completion of exposure of at least one substrate, and before exposure of a first shot region on a new substrate using the immersion exposure apparatus.