| 发明名称 |
METHOD FOR DEPOSITION BY SPUTTERING, RESULTING PRODUCT, AND SPUTTERING TARGET |
| 摘要 |
The subject of the invention is a process for obtaining a substrate coated with a photocatalytic film based on a mixed oxide of bismuth and at least one metal other than bismuth, comprising at least a step of depositing said oxide by a sputtering technique. |
| 申请公布号 |
US2012258858(A1) |
申请公布日期 |
2012.10.11 |
| 申请号 |
US201013382954 |
申请日期 |
2010.07.08 |
| 申请人 |
CHEMIN NICOLAS;GOUARDES ERIC;SAINT-GOBAIN GLASS FRANCE |
发明人 |
CHEMIN NICOLAS;GOUARDES ERIC |
| 分类号 |
C23C14/08;B01J23/18;C04B35/453;C23C14/34;C23C14/35 |
主分类号 |
C23C14/08 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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