发明名称 OPTICAL APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
摘要 <p>Provided is an optical apparatus equipped with a center-shielding type projection optical system comprising a plurality of reflecting mirrors, wherein the shape of a pupil is roughly uniform at each of the points within an effective imaging area, and a good optical performance can be secured. The optical apparatus, which is provided with an optical system comprising a plurality of reflecting mirrors arranged between a first face and a second face, and forms an image of the first face on the second face, is also provided with an iris-diaphragm member for prescribing the external shape of luminous flux, and a shielding section for shielding a portion of the luminous flux. The iris-diaphragm member comprises an inner circumferential edge that has varying heights in the optical-axis direction of the optical system, and the shielding section comprises an outer circumferential edge that has varying heights in the optical-axis direction.</p>
申请公布号 WO2012137699(A1) 申请公布日期 2012.10.11
申请号 WO2012JP58817 申请日期 2012.04.02
申请人 NIKON CORPORATION;SHIRAISHI MASAYUKI 发明人 SHIRAISHI MASAYUKI
分类号 H01L21/027;G02B17/06;G03F7/20 主分类号 H01L21/027
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