CLEANING COMPOSITION FOR PHOTOLITHOGRAPHY

摘要

PURPOSE: A washing liquid composition for photo-lithography is provided to cure the surface of patterns and to increase the etching resistance of the composition. CONSTITUTION: A washing liquid composition for photo-lithography includes a solvent and a water soluble polymer with a repeating unit represented by chemical formula 1. In chemical formula 1, R1 to R3 are respectively hydrogen atoms or C1-20 linear, branched, or cyclic hydrocarbon groups; if X exists, X is a C1-20 linear, branched, or cyclic hydrocarbon group. The content of the aqueous polymer is in a range between 0.001 and 5 weight%. Remaining amount of the composition is the solvent.