<p>Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber; at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.</p>
申请公布号
EP2206141(A4)
申请公布日期
2012.10.10
申请号
EP20080859696
申请日期
2008.10.17
申请人
ROUSSILLON, YANN;UTTACHOO, PIYAPHANT;GREEN, GEOFF T.;SHELTON, ADDISON;SCHOLZ, JEREMY H.
发明人
ROUSSILLON, YANN;UTTACHOO, PIYAPHANT;GREEN, GEOFF T.;SHELTON, ADDISON;SCHOLZ, JEREMY H.