| 摘要 |
In a method for applying coatings to the front surface of a substrate (10) in a vacuum chamber by sputtering, during or after formation of a front side transition layer (TL) (12), precursors (PR) for mechanical property modifying reaction products (RP) (14) for incorporation into TL are supplied to the vacuum chamber at a gas phase concentration such that (a) deposition of PR and/or RP without simultaneous sputtering is suppressed and (b) during sputtering the deposition of PR and/or RP occurs (almost) exclusively in a region opposite to the sputtering target (preferably on the front surface of the substrate). An independent claim is included for apparatus for the process, comprising an evacuable vacuum chamber with a precursor inlet, via which a predetermined concentration of precursors is supplied using a control device. |
