发明名称 |
METHOD FOR MANUFACTURING MICRO PATTERN |
摘要 |
<p>PURPOSE: A method for manufacturing a micro pattern is provided to shorten processing time by performing a texturing process of a substrate in a stamp method. CONSTITUTION: A predetermined stamp pattern is formed on the lower side of a microstructure corresponding to a pattern(S10). Etchant is selectively arranged along the stamp pattern(S20). An etchant pattern is formed for printing the pattern on a substrate. The etchant pattern is contacted to the surface of the substrate. The substrate is etched(S30). The substrate is drowned in the etchant(S40). [Reference numerals] (AA) Start; (BB) End; (S10) Stamp patterning step; (S20) Etchant arrangement step, etchant contact to a stamp pattern; (S30) Substrate etching step; (S40) Substrate erosion step</p> |
申请公布号 |
KR20120111036(A) |
申请公布日期 |
2012.10.10 |
申请号 |
KR20110029284 |
申请日期 |
2011.03.31 |
申请人 |
DMS CO., LTD. |
发明人 |
LEE, JONG KWAN;KIM, JONG WAN;YANG, JAE YOUNG;KIM, JUN TAK;KIM, SUNG HAE;KIM, JUNG KWON |
分类号 |
H01L31/18;H01L31/0236;H01L31/04 |
主分类号 |
H01L31/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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