| 摘要 |
PURPOSE: A pattern processing apparatus is provided to revise thickness change and uneven thickness deviation of a light guide plate. CONSTITUTION: A leading-in device(1) equips a transfer unit for transferring a light guide plate(100). A transcription plate for forming a pattern on the surface of the light guide plate is mounted on the exterior of upper and lower pattern forming rollers(52,52'). A pattern forming device(5) comprises a gap adjustment unit and a driving unit. The gap adjustment unit controls the height of the lower pattern forming roller. The driving unit is respectively connected to the upper and lower pattern forming rollers. An extracting device(7) is comprised of a discharging unit and a sensing unit. The discharging unit discharges the light guide plate from the pattern forming device. The sensing unit senses whether the light guide plate is arrived or not. |
