发明名称 |
SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SAME AND ELECTRONIC DEVICE INCLUDING SEMICONDUCTOR DEVICE |
摘要 |
<p>PURPOSE: A semiconductor device, a manufacturing method thereof and an electronic device including the semiconductor device are provided to increase the on/off ratio of a transistor by applying a patterned graphene layer as a unit layer. CONSTITUTION: A semiconductor element includes a plurality of unit layers(L1-L4) separated in the vertical direction. The semiconductor element is used as a channel layer. An insulating layer(IN1-IN3) is formed between the unit layers. The unit layer respectively includes a graphene layer. The patterned graphene layer has a nano mesh structure.</p> |
申请公布号 |
KR20120110873(A) |
申请公布日期 |
2012.10.10 |
申请号 |
KR20110029035 |
申请日期 |
2011.03.30 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, SUN KOOK;CHOI, WOONG;JIN, YONG WAN |
分类号 |
H01L29/78;H01L21/336 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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