发明名称 POSITIVE TYPED PHOTOSENSITIVE COMPOSITION COMPRISING NOVLE POLYAMIDE DERIVATIVES
摘要 <p>PURPOSE: A positive type photo-sensitive resin composition containing a polyamide derivative is provided to reduce the loss of a non-exposed part after development and to improve thermal stability. CONSTITUTION: A positive type photo-sensitive resin composition includes a polyamide derivative represented by chemical formula 1. In chemical formula 1, R1, R2, R4, and R5 are respectively divalent to hexavalent acyl groups with two or more carbon atoms; R3 is a hydrogen atom or a C1-10 alkyl group; k is the integer of 10 to 1000; l is the integer of 1 to 1000; n and m are respectively the integer of 0 to 2; the sum of n and m is more than 0; and X is a C2-30 carboxylic group.</p>
申请公布号 KR20120110896(A) 申请公布日期 2012.10.10
申请号 KR20110029074 申请日期 2011.03.30
申请人 KOREA KUMHO PETROCHEMICAL CO., LTD. 发明人 LEE, JONG BUM;KANG, SEOK CHAN;SON, KYUNG CHUL
分类号 G03F7/039;G03F7/022;H01L21/027 主分类号 G03F7/039
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