发明名称 |
POSITIVE TYPED PHOTOSENSITIVE COMPOSITION COMPRISING NOVLE POLYAMIDE DERIVATIVES |
摘要 |
<p>PURPOSE: A positive type photo-sensitive resin composition containing a polyamide derivative is provided to reduce the loss of a non-exposed part after development and to improve thermal stability. CONSTITUTION: A positive type photo-sensitive resin composition includes a polyamide derivative represented by chemical formula 1. In chemical formula 1, R1, R2, R4, and R5 are respectively divalent to hexavalent acyl groups with two or more carbon atoms; R3 is a hydrogen atom or a C1-10 alkyl group; k is the integer of 10 to 1000; l is the integer of 1 to 1000; n and m are respectively the integer of 0 to 2; the sum of n and m is more than 0; and X is a C2-30 carboxylic group.</p> |
申请公布号 |
KR20120110896(A) |
申请公布日期 |
2012.10.10 |
申请号 |
KR20110029074 |
申请日期 |
2011.03.30 |
申请人 |
KOREA KUMHO PETROCHEMICAL CO., LTD. |
发明人 |
LEE, JONG BUM;KANG, SEOK CHAN;SON, KYUNG CHUL |
分类号 |
G03F7/039;G03F7/022;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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