| 摘要 |
FIELD: chemistry. ^ SUBSTANCE: invention relates to a method of producing polysiloxane urethane, which can be used as film vapour- and gas-permeable polymer materials and protective coatings on fabric. The disclosed method is realised by reacting a low-molecular weight diol, organosiloxane and an aromatic diisocyanate in the medium of an aprotic solvent. The low-molecular weight diol used is an ethylene oxide- and propylene oxide-based block copolymer with molecular weight of 4000-4500 and content of terminal hydroxyl groups of 80-99 wt % and potassium (sodium) alcoholate groups of 1-20 wt %. The organosiloxane used is cyclotetrasiloxane of formula: , where R is -CH3, -C2H5, -C6H5, -CH=CH2. The molar ratio of the ethylene oxide- and propylene oxide-based block copolymer, aromatic diisocyanate and cyclotetrasiloxane is equal to 1:(10-30):(3-40), respectively. ^ EFFECT: simple process of producing polysiloxane urethane, as well as obtaining polysiloxane urethane with high ultimate tensile stress, modulus of elasticity and vapour permeability, a porous structure, gas permeability and heat-resistance. ^ 19 ex, 1 tbl, 2 dwg |
