发明名称 Solid-state imaging device and method of manufacturing solid-state imaging device
摘要 A solid state imaging device having a back-illuminated type structure in which a lens is formed on the back side of a silicon layer with a light-receiving sensor portion being formed thereon. Insulating layers are buried into the silicon layer around an image pickup region, with the insulating layer being buried around a contact layer that connects an electrode layer of a pad portion and an interconnection layer of the surface side. A method of manufacturing such a solid-state imaging device is also provided.
申请公布号 US8283746(B2) 申请公布日期 2012.10.09
申请号 US20070723241 申请日期 2007.03.19
申请人 YAMAMOTO YUICHI;IWAMOTO HAYATO;SONY CORPORATION 发明人 YAMAMOTO YUICHI;IWAMOTO HAYATO
分类号 H01L21/30;H01L27/14;H01L27/146;H01L27/148;H01L31/10 主分类号 H01L21/30
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