| 摘要 |
<p>PURPOSE: A lithography apparatus and a manufacturing method for devices are provided to prevent a system for driving the movement of a support from being overheated. CONSTITUTION: A lithography apparatus includes a support, a projection system, a second planar element, and a support driver. The support includes a first planar element with a first flow restriction surface(8B, 9B, 10B, 11B). The second planar element includes a second flow restriction surface which faces the first flow restriction surface. A protruded part and/or a recessed part is arranged on or between the first and second flow restriction surfaces. The support driver linearly drives the support in relation to the second planar element.</p> |
