ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION

摘要

PURPOSE: An active ray-sensitive or radiation-sensitive resin composition, an active ray-sensitive or radiation-sensitive film using the composition, and a pattern forming method are provided to improve roughness characteristic. CONSTITUTION: An active ray-sensitive or radiation-sensitive resin composition includes a resin and at least one selected from compounds generating acid by the irradiation of active rays or radiation rays represented by chemical formulas ZI-3, ZI-4, or ZI-5. The dissolution of the resin to an alkali developing solution increases by the action of the acid. The resin includes at least one repeating unit with a group which is decomposed by the action of the acid and deintercalates a deintercalating group with a cyclic structure. The deintercalating group with the cyclic group includes either a polar group as a substituent or a polar atom as a part of the cyclic group. The log P of the compound derived from the deintercalating group with the cyclic group is more than or equal to 0 and is less than 2.8.