发明名称 PATTERN FORMING METHOD AND PATTERN FORMING APPARATUS
摘要 PURPOSE: A pattern formation method and apparatus are provided to form a pattern of desire shape by accurately radiating light to a coating solution and hardening the coating solution. CONSTITUTION: A substrate support unit(3) maintains a substrate(W). A nozzle(523) comprises a discharging port which consecutively discharges a coating solutions including photo hardening type material. A light output unit(53) emits light to the coating solution which is discharged from the discharging port. A transport tool(2) transfers the nozzle in a predetermined scanning moving direction along the surface of the substrate. The transport tool is installed on a support frame(101). A frame is fixed to the support frame. A head unit is attached to the frame. [Reference numerals] (532) Light source unit; (6) Controller
申请公布号 KR20120109976(A) 申请公布日期 2012.10.09
申请号 KR20110112850 申请日期 2011.11.01
申请人 TENJINKITA-MACHI 1-1, TERANOUCHI-AGARU 4-CHOME, HORIKAWA-DORI, KAMIGYO-KU, KYOTO-SHI, KYOTO 602-8585, JAPAN 发明人 IWASHIMA MASANOBU;SANADA MASAKAZU
分类号 H01L31/18;H01L31/042 主分类号 H01L31/18
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