PATTERN FORMING METHOD AND PATTERN FORMING APPARATUS
摘要
PURPOSE: A pattern formation method and apparatus are provided to form a pattern of desire shape by accurately radiating light to a coating solution and hardening the coating solution. CONSTITUTION: A substrate support unit(3) maintains a substrate(W). A nozzle(523) comprises a discharging port which consecutively discharges a coating solutions including photo hardening type material. A light output unit(53) emits light to the coating solution which is discharged from the discharging port. A transport tool(2) transfers the nozzle in a predetermined scanning moving direction along the surface of the substrate. The transport tool is installed on a support frame(101). A frame is fixed to the support frame. A head unit is attached to the frame. [Reference numerals] (532) Light source unit; (6) Controller
申请公布号
KR20120109976(A)
申请公布日期
2012.10.09
申请号
KR20110112850
申请日期
2011.11.01
申请人
TENJINKITA-MACHI 1-1, TERANOUCHI-AGARU 4-CHOME, HORIKAWA-DORI, KAMIGYO-KU, KYOTO-SHI, KYOTO 602-8585, JAPAN