SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

摘要

PURPOSE: A substrate processing apparatus and a method for processing a substrate are provided to prevent a decrease in inner temperature of a chamber and a processing tank by including a cover covering the upper part of the chamber. CONSTITUTION: A chamber(1) includes a cover(5) covering the upper part of the chamber. A processing tank(2) is formed in the chamber. The processing tank stores processing liquid and receives a substrate(W). A discharge tube(70,71) supplies the processing liquid to the substrate. A nozzle switching valve(40,41) is installed on the discharge tube. A liquid surface sensor(PS1) detects a liquid surface level stored in the processing tank. A processing tank liquid supply pipe(60-62) includes a processing liquid supply unit to supply the processing liquid. [Reference numerals] (AA) Exhaust; (BB) Drainage