PLASMA PROCESSING APPARATUS

摘要

PURPOSE: A plasma processing apparatus is provided to reduce pressure loss within a gas pipe without an increase in manufacturing costs of the gas pipe. CONSTITUTION: A gas supply part(14) supplies process gas to the inside of a process container(12). A microwave generator(16) generates microwaves. An antenna(18) introduces the microwaves for exciting plasma within the process container. A coaxial waveguide(20) is installed between the microwave generator and the antenna. A holding part(22) is placed to face the antenna in an extension direction of a central axis line of the coaxial waveguide. The holding part is provided in order to preserve processed gas. A dielectric window(24) is installed between the antenna and the holding part. The dielectric window transmits the microwaves from the antenna inside the process container. A dielectric rod(26) is placed between the holding part and the dielectric window along the central axis line. [Reference numerals] (AA,BB) Gas