| 摘要 |
PURPOSE: An apparatus and method for forming a film are provided to suppress the thermal degradation of peripheral members due to radiation heat of a heater. CONSTITUTION: A shower plate(220) uniformly supplies a process gas(225) on the surface of a semiconductor substrate(206). A susceptor(207) is rotated by a rotary tank(223). A supply unit(204) is installed on the upper part of a chamber(201) for supplying the process gas. The process gas is supplied to a liner(202) through the shower plate. A heater(208) is installed in the rotary tank.
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