| 摘要 |
PURPOSE: A manufacturing method of a photo mask, a pattern transferring method, and a manufacturing method of a display device are provided to pattern fine line and space patterns on a target to be processed without increasing exposure. CONSTITUTION: A manufacturing method of a photo mask manufactures a photo mask(100) with patterns to be transferred(102p) on a transparent substrate. The patterns to be transferred include line and space patterns of the pitches P. The patterns to be transferred are transferred on a positive type resist film(203) in order to form resist patterns(203p) by exposure using the photo mask. Line and space film patterns(202p) are formed on a target to be processed(202) by etching using the resist patterns as a mask. The line width and the space width of the film patterns are respectively WL and WS. |
