APPARATUS FOR PROCESING SUBSTRATE

摘要

PURPOSE: A substrate processing apparatus is provided to evenly deposit a plurality of raw materials, which is provided from a first unit in a center region and a second unit in a peripheral region, on a substrate. CONSTITUTION: A substrate support unit(40) is included in a processing chamber(10). The substrate support unit supports a substrate(S). A heating unit is included in top or lower parts of the substrate support unit. A raw material supply unit supplies the raw materials to the inside of the process chamber. The raw material supply unit includes a first unit(252) in a center region and a second unit(262) in a peripheral region.