发明名称 THERMAL TREATMENT DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a thermal treatment device capable of restraining vibrations of a substrate immediately after flash light radiation. <P>SOLUTION: A tip end 72a of a L-sectioned coupling part 72 is welded and fastened to a peripheral edge of a disc-shaped susceptor 74. Meanwhile, a base end 72b of the coupling part 72 is welded and fastened to an annular base ring 71. The base ring 71, the coupling part 72 and the susceptor 74 are all formed of quartz. The peripheral edge of the susceptor 74 and the base ring 71 are fastened to the both ends of the L-sectioned coupling part 72, and therefore, stress rapidly applied to the susceptor 74 and a semiconductor wafer held by the susceptor 74 can be mitigated by flash light radiation, and vibrations of the semiconductor wafer and the susceptor 74 can be restrained immediately after the flash light radiation. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012191110(A) 申请公布日期 2012.10.04
申请号 JP20110055199 申请日期 2011.03.14
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KOBAYASHI IPPEI
分类号 H01L21/26;H01L21/265 主分类号 H01L21/26
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