发明名称 BASE SURFACE PROCESSING METHOD AND MEMS DEVICE
摘要 A base surface processing method includes forming a protective film on a base surface; thinning a part of a base by grinding a part of the base surface; and etching a ground surface ground by the thinning.
申请公布号 US2012251783(A1) 申请公布日期 2012.10.04
申请号 US201213432680 申请日期 2012.03.28
申请人 SAKAMOTO TAKESHI;TAKEUCHI JUNICHI;SEIKO EPSON CORPORATION 发明人 SAKAMOTO TAKESHI;TAKEUCHI JUNICHI
分类号 B32B3/00;B23P17/00 主分类号 B32B3/00
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