APPARATUS FOR CLEANING EXHAUST PASSAGE FOR SEMICONDUCTOR CRYSTAL MANUFACTURING DEVICE AND METHOD FOR CLEANING SAME

摘要

An apparatus for cleaning an exhaust passage for a semiconductor crystal manufacturing device is constructed so as to remove dust (36) deposited in an exhaust passage (29) provided in a chamber (12) to exhaust a gas in the chamber (12) of the semiconductor crystal manufacturing device by absorbing the dust (36) from the outside of the chamber. On-off valves (31 to 34) for cleaning which are removably attached to opening parts (12b to 12e) of the exhaust passage facing the chamber intermittently open or close the opening parts during absorption. Further, the on-off valves for cleaning are driven by valve driving means (41 to 44). The dust deposited in the exhaust passage is removed efficiently and thus the cleaning time for the exhaust passage is shortened and the pressure fluctuation in the chamber is restrained during the production of a semiconductor crystal.