发明名称 SOLID-STATE IMAGING DEVICE, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To suppress deterioration of photosensitivity of a solid-state imaging device. <P>SOLUTION: This solid-state imaging device includes: a plurality of pixel regions each containing a pixel 2 having a photoelectric conversion part for converting incident light to an electric signal, a color filter 15 formed correspondingly to the pixel 2, and a microlens 16 for condensing the incident light to the photoelectric conversion part through the color filter 15; a first shading part 17 formed on the side part of the pixel region while having a first end face on the microlens 16 side and a second end face facing the first end face; and a second shading part 18 formed at the corner part of the pixel region while having a first end face on the microlens 16 side and a second end face facing the first end face. In the shading part 18, a distance from the surface of the pixel 2 till the first end face is shorter than that of the first shading part 17. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012191136(A) 申请公布日期 2012.10.04
申请号 JP20110055630 申请日期 2011.03.14
申请人 SONY CORP 发明人 OTSUKA YOICHI
分类号 H01L27/14 主分类号 H01L27/14
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